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Single & Double Side Optical Mask Aligners

Single & Double Side Optical Mask Aligners
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Photolithography is a process used in microfabrication to transfer geometric patterns to a film or substrate. The importance of lithography can be appreciated in two ways. First, due to the large number of lithography steps needed in Integrated Circuits (IC) manufacturing, lithography typically accounts for about 30 percent of the cost of manufacturing. Second, lithography tends to be the technical limiter for further advances in feature size reduction and thus transistor speed and silicon area. Although lithography is certainly not the only technically important and challenging process in the IC manufacturing flow, historically, advances in lithography have gated advances in IC cost and performance.

The main core of any lithography device is its exposure system. Because the minimum feature size that can be transferred with high fidelity to a resist film on the surface of the wafer is highly related to the wavelength of the light source. In this product the UV lamp is used to expose photoresist.

It should be noted that in real projects it is necessary to create several layers on each other and in these cases alignment of layers together is needed. Alignment system consists of mechanical system for high resolution movement of the sample, microscope and exposure system.

  • Fabrication of Integrated Circuits (IC), data storage devices, miniaturized sensors, MEMS and NEMS

The Single & Double Side Optical Mask Aligners provided by this company are designed and produced each one in two different models. Details of technical specifications are presented in the following Table.

To create a device layers of thin films have to be patterned, etched and coated. Lithography combines these processes and can create millions of devices in batch. Thus in order to create micrometer patterns in different substrates and subsequently create nanostructures, lithography has to be done.

  • Lithography must be done in cleanroom.
  • Put the specimen or mask inside the device using gloves and keep the inside chamber free from contaminants.
  • Before exposure and spinning, make sure the vacuum pump is on and the sample is kept on the holder.
  • For more details on how to use the device, refer to the device catalog and user guide.
  • During exposure, be sure to wear UV-protective glasses and do not stare at all.
  • During operation, keep your hair, hands and clothes away from mechanical parts.
  • Avoid moving the device when the heater is still hot.
  • Use forceps to put the specimen on the heater or to remove it.

Product Standard

  • Certificate of Nanotechnology

    Certificate of Nanotechnology

    Standard Date : 2018/08/22

    Expire Date : 2021/08/23

  • NanoScale Certification

    NanoScale Certification

    Standard Date : 2018/08/22

    Expire Date : 2021/08/23

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